袁建宇教授与马万里教授合作在energy environ. sci.上发表论文-尊龙凯时

发布时间:2025-03-10访问量:15

题目:

buried interface engineering enables efficient and refurbished cspbi3 perovskite quantum dot solar cells

作者:

huifeng li1, hehe huang1, du li1, xuliang zhang1,2, chenyu zhao1, xinyu zhao1, wanli ma1,3* and jianyu yuan1,2*

单位:

1institute of functional nano & soft materials (funsom), soochow university, 199 ren-ai road, suzhou industrial park, suzhou, jiangsu, 215123, p. r. china.

2jiangsu key laboratory of advanced negative carbon technologies, soochow university, 199 ren-ai road, suzhou industrial park, suzhou, jiangsu, 215123, p. r. china.

3jiangsu key laboratory for carbon-based functional materials and devices, soochow university, 199 ren-ai road, suzhou industrial park, suzhou, jiangsu, 215123, p. r. china.

摘要:

interfacial engineering has proven to be extremely important for colloidal quantum dot (qd) solar cells. however, in comparison with the qd surface and device top interface, the buried interface has received much less attention. herein, we report an efficient strategy of utilizing a cyclic passivator (cyp), namely, acesulfame potassium, to modulate a titanium oxide (tio2)/cspbi3 qd buried interface. the isotropic cyp can effectively passivate defects at the tio2 and cspbi3 qd surface through target chemical binding and, hence, facilitate interfacial charge extraction and transport. substantially, the cyp-engineered buried interface delivers a high power conversion efficiency (pce) of 17.50% for all-inorganic cspbi3 perovskite qd solar cells. more importantly, we first report the refurbishment of high-efficiency qd solar cells, and cyp-buried modulation can assist in the recycling of high-cost tio2/f-doped tin oxide electrodes. the pce of the cyp-engineered refurbished cspbi3 qd device remains over 90% of the corresponding fresh one after up to the 4th round of recycling of retired devices. these findings reveal the importance and potential of the buried interface that will propel both the performance and sustainable development of qd-based optoelectronic devices

影响因子:

32.4

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